Image sensor having improved full well capacity and related method of formation

ABSTRACT

In some embodiments, a method is provided. The method includes forming a plurality of trenches in a semiconductor substrate, where the trenches extend into the semiconductor substrate from a back-side of the semiconductor substrate. An epitaxial layer comprising a dopant is formed on lower surfaces of the trenches, sidewalls of the trenches, and the back-side of the semiconductor substrate, where the dopant has a first doping type. The dopant is driven into the semiconductor substrate to form a first doped region having the first doping type along the epitaxial layer, where the first doped region separates a second doped region having a second doping type opposite the first doping type from the sidewalls of the trenches and from the back-side of the semiconductor substrate. A dielectric layer is formed over the back-side of the semiconductor substrate, where the dielectric layer fill the trenches to form back-side deep trench isolation structures.

REFERENCE TO RELATED APPLICATIONS

This Application is a Continuation of U.S. application Ser. No.16/815,409, filed on Mar. 11, 2020, which is a Divisional of U.S.application Ser. No. 16/113,066, filed on Aug. 27, 2018 (now U.S. Pat.No. 10,658,410, issued on May 19, 2020). The contents of theabove-referenced Patent Applications are hereby incorporated byreference in their entirety.

BACKGROUND

Digital cameras and optical imaging devices employ image sensors. Imagesensors convert optical images to digital data that may be representedas digital images. An image sensor typically includes an array of pixelsensors, which are unit devices for the conversion of an optical imageinto electrical signals. Pixel sensors often manifest as charge-coupleddevices (CCDs) or complementary metal oxide semiconductor (CMOS)devices. However, CMOS pixel sensors have recently received moreattention. Relative to CCD pixel sensors, CMOS pixel sensors providelower power consumption, smaller size, and faster data processing.Further, CMOS pixel sensors provide a direct digital output of data, andgenerally have a lower manufacturing cost compared with CCD pixelsensors.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 illustrates a cross-sectional view of some embodiments of acomplementary metal-oxide-semiconductor (CMOS) image sensor comprisingsecond doped regions disposed between first doped regions and adielectric layer to improve full well capacity.

FIGS. 2A-2C illustrate cross-sectional views of various embodiments ofan integrated chip (IC) comprising the CMOS image sensor of FIG. 1 .

FIG. 3 illustrates a cross-sectional view of some embodiments of aback-side illumination CMOS (BSI-CMOS) image sensor comprising a seconddoped region disposed between a first doped region and a dielectriclayer to improve full well capacity.

FIG. 4 illustrates a cross-sectional view of some embodiments of astacked CMOS image sensor comprising the back-side illumination CMOS(BSI-CMOS) image sensor of FIG. 3 coupled to a second integrated chip(IC).

FIGS. 5-13 illustrate a series of cross-sectional views of someembodiments for forming a stacked CMOS image sensor comprising a seconddoped region disposed between a first doped region and a dielectriclayer to improve full well capacity.

FIG. 14 illustrates a flowchart of some embodiments of a method forforming a stacked CMOS image sensor comprising a second doped regiondisposed between a first doped region and a dielectric layer to improvefull well capacity.

DETAILED DESCRIPTION

The present disclosure will now be described with reference to thedrawings wherein like reference numerals are used to refer to likeelements throughout, and wherein the illustrated structures are notnecessarily drawn to scale. It will be appreciated that this detaileddescription and the corresponding figures do not limit the scope of thepresent disclosure in any way, and that the detailed description andfigures merely provide a few examples to illustrate some ways in whichthe inventive concepts can manifest themselves.

The present disclosure provides many different embodiments, or examples,for implementing different features of this disclosure. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. For example, the formation of a firstfeature over or on a second feature in the description that follows mayinclude embodiments in which the first and second features are formed indirect contact, and may also include embodiments in which additionalfeatures may be formed between the first and second features, such thatthe first and second features may not be in direct contact. In addition,the present disclosure may repeat reference numerals and/or letters inthe various examples. This repetition is for the purpose of simplicityand clarity and does not in itself dictate a relationship between thevarious embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

Many portable electronic devices (e.g., cameras, cellular telephones,etc.) include an image sensor for capturing images. One example of suchan image sensor is a complementary metal-oxide-semiconductor (CMOS)image sensor including an array of active pixel sensors. Each of theactive pixel sensors comprises a photodetector disposed in asemiconductor substrate. The photodetector comprises a p-n junction thatexists between a first doped region, which has a first doping type(e.g., n-type doping), and second doped region, which has a seconddoping type (e.g., p-type doping) opposite the first doping type.

In the case of the CMOS image sensor, device scaling may reduce thedimensions of the first doped region. However, reducing the dimensionsof the first doped region makes it more difficult to control a profileof the first doped region when utilizing an ion implantation processthat implants ions into a front-side of the semiconductor substrate toform the first doped region. Thus, the full well capacity (e.g., theamount of charge a photodetector can accumulate before saturation) ofthe photodetector may be reduced due to the ion implantation processundesirably reducing the size of the first doped region. Reducing thefull well capacity of the photodetector may negatively affect theperformance of the CMOS image sensor by, for example, reducing the highdynamic range of the active pixel sensors.

In addition, deep trench isolation (DTI) structures are often arrangedbetween adjacent first doped regions to isolate neighboringphotodetectors. Due to the difficulty in controlling the profile of thefirst doped regions, some first doped regions may contact the DTIstructures (e.g., due to the size of the first doped region beingundesirably increased by the ion implantation process). Due to defectsalong an interface (e.g., silicon (Si)—silicon dioxide (SiO₂) interfacetraps) between the DTI structure and the semiconductor substrate, theDTI structures may generate noise signals that increase dark currentand/or white pixel numbers. One possible solution to reduce these noisesignals is to arrange a high-k dielectric layer between the DTIstructures and the semiconductor substrate. However, this may increasemanufacturing complexities (e.g., additional deposition processes,photolithography processes, etching processes, etc.), and thus increasethe cost to manufacture the CMOS image sensor.

In various embodiments, the present disclosure is directed toward a CMOSimage that uses a doped epitaxial layer to control a profile of a firstdoped region to improve full well capacity. In some embodiments, theCMOS image sensor has a photodetector having a first doped regiondisposed in a semiconductor substrate. The dielectric layer is disposedover the semiconductor substrate and comprises a DTI structure thatextends into the semiconductor substrate on a side of the first dopedregion. An epitaxial layer is arranged between the dielectric layer andthe semiconductor substrate. The second doped region is disposed in thesemiconductor substrate and separates the epitaxial layer from the firstdoped region. In addition, the epitaxial layer comprises a dopant havingan opposite doping type than the first doped region.

Because the epitaxial layer comprises a dopant having an opposite dopingtype as the first doped region and because the epitaxial layer isdisposed between the dielectric layer and the semiconductor substrate,the dopant can be driven from the epitaxial layer into the semiconductorsubstrate to form the second doped region. Driving the dopant of theepitaxial layer into the semiconductor substrate to form the seconddoped region provides greater control over the profile of the firstdoped region than forming the first doped region with an ionimplantation process that implants ions into a front-side of thesemiconductor substrate. Thus, the size of the first doped region may beincreased; thereby improving performance of the CMOS image sensor byincreasing the full well capacity of the photodetector. In addition, thesecond doped region may isolate (e.g., by p-n junction isolation) thefirst doped region from the DTI structures. Thus, without increasingmanufacturing complexities, dark current performance and/or white pixelnumbers of the CMOS image sensor may be improved by preventing the noisesignals generated by the DTI structures (e.g., Si—SiO₂ interface traps)from being collected by the photodetector. Accordingly, the cost tomanufacture the CMOS image sensor may be reduced.

FIG. 1 illustrates a cross-sectional view of some embodiments of acomplementary metal-oxide-semiconductor (CMOS) image sensor 100comprising second doped regions disposed between first doped regions anda dielectric layer to improve full well capacity.

As shown in FIG. 1 , the CMOS image sensor 100 comprises a semiconductorsubstrate 102 having a plurality of photodetectors 103 a-103 c. In someembodiments, the plurality of photodetectors 103 a-103 c comprises afirst photodetector 103 a, a second photodetector 103 b, and a thirdphotodetector 103 c. The photodetectors 103 a-103 c are configured toconvert incident radiation 118 (e.g., photons) into an electricalsignal.

Each of the photodetectors 103 a-103 c comprises a first doped region104. In some embodiments, the first doped region 104 may comprise aregion of the semiconductor substrate 102 having a first doping type(e.g., n-type doping). In further embodiments, each of thephotodetectors 103 a-103 c comprises a p-n junction that exists betweenthe first doped region 104 and a second doped region 124 having a seconddoping type (e.g., p-type doping) opposite the first doping type. In yetfurther embodiments, the photodetectors 103 a-103 c may be disposed inthe semiconductor substrate 102 in an array comprising rows and/orcolumns.

A well region 107 is disposed in the semiconductor substrate 102 near afront-side 102 f of the semiconductor substrate. The well region 107extends into the semiconductor substrate 102 from the front-side 102 fof the semiconductor substrate 102 to a position in the semiconductorsubstrate 102 disposed between the front-side 102 f of the semiconductorsubstrate 102 and a back-side 102 b of the semiconductor substrate 102opposite the front-side 102 f of the semiconductor substrate 102. Insome embodiments, the well region 107 comprises the second doping type(e.g., p-type doping).

A dielectric layer 106 is disposed over the semiconductor substrate 102.Further, a plurality of regions of the dielectric layer 106 respectivelyextend into the semiconductor substrate 102 between the photodetectors103 a-103 c. In some embodiments, the dielectric layer 106 is disposedover the back-side 102 b of the semiconductor substrate 102. In furtherembodiments, the back-side 102 b of the semiconductor substrate 102opposes an interconnect structure 108 comprising a plurality ofconductive features 110 (e.g., conductive lines, conductive vias,contact pads, etc.) that are disposed in an interlayer dielectric (ILD)layer 112. In further embodiments, the dielectric layer 106 may comprisean oxide, a nitride, or some other dielectric material. In furtherembodiments, the dielectric layer 106 is a continuous layer that extendsover the back-side 102 b of the semiconductor substrate 102 and into thesemiconductor substrate through the back-side 102 b of the semiconductorsubstrate 102.

Deep trench isolation (DTI) structures 114 are disposed in thesemiconductor substrate 102. The DTI structures 114 comprise the regionsof the dielectric layer 106 that extend into the semiconductor substrate102 between the photodetectors 103 a-103 c, respectively. The DTIstructures 114 are configured to isolate (e.g., noise signals)neighboring photodetectors 103 a-103 c. In some embodiments, the DTIstructures 114 may be back-side deep trench isolation (BDTI) structuresthat vertically extend from the back-side 102 b of the semiconductorsubstrate 102 to locations in the semiconductor substrate 102. Infurther embodiments, the DTI structures 114 extend into the well region107. In other embodiments, the DTI structures 114 have lower surfacesthat are disposed between the well region 107 and the back-side 102 b ofthe semiconductor substrate 102.

A plurality of color filters 116 a-116 c are disposed over thedielectric layer 106. The plurality of color filters 116 a-116 c arerespectively to transmit specific wavelengths of incident radiation 118.For example, a first color filter 116 a (e.g., a red color filter) maytransmit light having wavelengths in a first range, a second colorfilter 116 b (e.g., a green color filter) may transmit light havingwavelengths in a second range different than the first range, and athird color filter 116 c (e.g., a blue color filter) may transmit lighthaving wavelengths in a third range different than the first and secondrange. A plurality of micro-lenses 120 are disposed over the pluralityof color filters 116 a-116 c. Respective micro-lenses 120 are alignedlaterally with the color filters 116 a-116 c and overlie thephotodetectors 103 a-103 c. The micro-lenses 120 are configured to focusthe incident radiation 118 (e.g., light) towards the photodetectors 103a-103 c.

An epitaxial layer 122 is disposed between the dielectric layer 106 andthe semiconductor substrate 102 and between the DTI structures 114 andthe semiconductor substrate 102. In some embodiments, the epitaxiallayer 122 separates the dielectric layer 106 from the back-side 102 b ofthe semiconductor substrate 102. In some embodiments, the epitaxiallayer 122 separates a lower surface and sidewalls of the DTI structures114 from the semiconductor substrate 102. In further embodiments, theepitaxial layer 122 is a continuous layer, and continuously separatesthe DTI structures 114 from the semiconductor substrate 102 andcontinuously separates the dielectric layer 106 from the back-side 102 bof the semiconductor substrate 102. In yet further embodiments, theepitaxial layer 122 may continuously contact the back-side 102 b of thesemiconductor substrate 102, lower surfaces of the DTI structures 114,and sidewalls of the DTI structures 114.

Further, the epitaxial layer 122 comprises a dopant having an oppositedoping type (e.g., p-type doping) as the first doped region 104. In someembodiments, the dopant may be, for example, boron (B), carbon (C),phosphorous (P), some other doping species, or a combination of theforgoing. In further embodiments, the epitaxial layer 122 has the samedoping type as the well region 107. In yet further embodiments, theepitaxial layer 122 is doped silicon.

Second doped regions 124 are disposed in the semiconductor substrate 102between the epitaxial layer 122 and the first doped regions 104,respectively. In some embodiments, the second doped regions 124 havesidewalls that extend from the back-side 102 b of the semiconductorsubstrate 102 into the well region 107. In further embodiments, each ofthe second doped regions 124 continuously separate the first dopedregion 104 of one of the photodetectors 103 a-103 c from the DTIstructures 114 and from the dielectric layer 106. In yet furtherembodiments, each of the second doped regions 124 may continuouslycontact the first doped region 104 of the one of the photodetectors 103a-103 c, a lower surface of the epitaxial layer 122, and sidewalls ofthe epitaxial layer 122. In various embodiments, each of the seconddoped regions 124 conformally line the lower surface of the epitaxiallayer 122 and the sidewalls of the epitaxial layer 122. In someembodiments, the second doped regions 124 are formed by dopants (e.g.,boron (B), carbon (C), etc.) diffusing from the epitaxial layer 122 intothe semiconductor substrate 102. In such embodiments, the second dopedregions 124 comprise the same doping type (e.g., p-type doping) as theepitaxial layer 122.

The second doped regions 124 isolate (e.g., by p-n junction isolation)the first doped region 104 of the photodetectors 103 a-103 c,respectively, from the DTI structures 114 and the dielectric layer 106.Thus, without increasing manufacturing complexities (e.g., additionaldeposition processes, photolithography processes, etching processes,etc.), the second doped regions 124 may improve dark current performanceand/or white pixel numbers of the CMOS image sensor 100 by preventingnoise signals caused by the DTI structures 114 (e.g., Si—SiO₂ interfacetraps) and/or the dielectric layer 106 from being collected byphotodetectors 103 a-103 c. Accordingly, the cost to manufacture theCMOS image sensor 100 may be reduced.

FIGS. 2A-2C illustrate cross-sectional views of some embodiments of anintegrated chip (IC) 200 comprising the CMOS image sensor 100 of FIG. 1.

As shown in FIG. 2A, the first photodetector 103 a and the secondphotodetector 103 b are disposed in the semiconductor substrate 102 andlaterally spaced from one another. The first photodetector 103 a and thesecond photodetector 103 b each comprise a first doped region 104. Insome embodiments, the first doped region 104 of the first photodetector103 a and the first doped region 104 of the second photodetector 103 bare discrete regions of the semiconductor substrate 102 comprising thefirst doping type.

A back-side deep trench isolation (BDTI) structure 204 is disposed inthe semiconductor substrate 102. The BDTI structure 204 extends from theback-side 102 b of the semiconductor substrate 102 to a position betweenthe first photodetector 103 a and the second photodetector 103 b. TheBDTI structure 204 comprises a region of the dielectric layer 106 thatextends into the semiconductor substrate 102 from the back-side 102 b ofthe semiconductor substrate 102 between the first photodetector 103 aand the second photodetector 103 b.

The epitaxial layer 122 separates the BDTI structure 204 and thedielectric layer 106 from the semiconductor substrate 102. In someembodiments, the epitaxial layer 122 has angled lower surfaces 122L thatrespectively extend outward from one another in opposite lateraldirections and vertically towards the back-side 102 b of thesemiconductor substrate 102. Further, the epitaxial layer 122 hassubstantially vertical sidewalls 122 s that extend from the angled lowersurfaces 122L towards the back-side 102 b of the semiconductor substrate102, respectively. Moreover, the epitaxial layer 122 has angled uppersidewalls 122 u that extend from the substantially vertical sidewalls122 s inward in opposite lateral directions toward one another andvertically to the back-side 102 b of the semiconductor substrate 102,respectively. In some embodiments, the angled upper sidewalls 122 uextend inward less than the angled lower surfaces 122L extend outward.

In some embodiments, the epitaxial layer 122 comprises doped siliconhaving the same doping type (e.g., p-type doping) as the well region107. In such embodiments, the epitaxial layer 122 may comprise a dopant,for example, boron (B), carbon (C), some other doping species, or acombination of the foregoing. In further embodiments, the epitaxiallayer 122 may have a doping concentration between about 1×10¹⁸ cm³ andabout 2×10²⁰ cm³. In further embodiments, the epitaxial layer 122 mayhave a thickness between about 1 nanometer (nm) and about 30 nm. Morespecifically, the epitaxial layer 122 may have a thickness between about1 nm and about 10 nm. In further embodiments, the epitaxial layer 122has a first thickness along the substantially vertical sidewalls 122 s,the angled upper sidewalls 122 u, and the angled lower surfaces 122L,and a second thickness greater than the first thickness along a bottomportion 122 b of the epitaxial layer 122.

In some embodiments, the angled lower surfaces 122L of the epitaxiallayer 122 contact the well region 107. In further embodiments, theangled lower surfaces 122L, of the epitaxial layer 122 contact a portionof the well region 107 that extends vertically between the firstphotodetector 103 a and the second photodetector 103 b, In yet furtherembodiments, the angled lower surfaces 122L, of the epitaxial layer 122may respectively extend outward beyond sidewalls of the portion of thewell region 107 that extends vertically between the first photodetector103 a and the second photodetector 103 b.

Second doped regions 124 are disposed in the semiconductor substrate 102between the epitaxial layer 122 and the first doped region 104 of thefirst photodetector 103 a and the epitaxial layer 122 and the firstdoped region 104 of the second photodetector 103 b, respectively. Insome embodiments, the second doped regions 124 extend into thesemiconductor substrate 102 from the back-side 102 b of thesemiconductor substrate 102 along the angled upper sidewalk 122 u of theepitaxial layer 122, along the substantially vertical sidewalls 122 s ofthe epitaxial layer 122, and along portions of the angled lower surfaces122L of the epitaxial layer 122 respectively. In such embodiments, thesecond doped regions 124 may conformally line the epitaxial layer 122.In further embodiments, the second doped regions 124 extend laterallyalong the back-side 102 b of the semiconductor substrate 102,respectively, such that the second doped regions 124 separate theback-side 102 b of the semiconductor substrate 102 from the first dopedregion 104 of the first photodetector 103 a and from the first dopedregion 104 of the second photodetector 103 b, respectively. In suchembodiments, the second doped regions 124 may conformally extend alongthe epitaxial layer 122 in lateral directions near the back-side 102 bof the semiconductor substrate 102.

In some embodiments, the second doped regions 124 may extend below theangled lower surfaces 122L of the epitaxial layer 122 into the wellregion 107, respectively. In such embodiments, portions of the seconddoped regions 124 that extend into the well region 107 (e.g., shown inphantom) may have a higher doping concentration than the well region107. In further such embodiments, the portions of second doped regions124 that extend into the well region 107 (e.g., shown in phantom) mayhave a higher doping concentration than portions of the second dopedregions 124 that are disposed outside of the well region 107.

In further embodiments, the second doped regions 124 are formed by adopant (e.g., boron (B), carbon (C), etc.) being driven from theepitaxial layer 122 into the semiconductor substrate 102. In suchembodiments, the second doped regions 124 comprise the same doping type(e.g., p-type doping) as the epitaxial layer 122. In furtherembodiments, the second doped regions 124 may have a thickness less thanabout 50 nm. In yet further embodiments, the second doped regions 124may have a doping concentration between about 1×10¹⁸ cm³ and about2×10²⁰ cm³.

The second doped regions 124 isolate (e.g., by p-n junction isolation)the first doped region 104 of the first photodetector 103 a from theBDTI structure 204 and the first doped region 104 of the secondphotodetector 103 b from the BDTI structure 204, respectively. Thus,without increasing manufacturing complexities (e.g., additionaldeposition processes, photolithography processes, etching processes,etc.), the second doped regions 124 may improve dark current performanceand/or white pixel numbers of the CMOS image sensor 100 by preventingnoise signals caused by the BDTI structure 204 (e.g., Si—SiO₂ interfacetraps) and/or the dielectric layer 106 from being collected by the firstphotodetector 103 a and/or the second photodetector 103 b, respectively.Accordingly, the cost to manufacture the IC 200 may be reduced.

As shown in FIG. 2B, the epitaxial layer 122 is conformally disposedbetween the dielectric layer 106 and the semiconductor substrate 102,such that the epitaxial layer 122 is conformally disposed between theBDTI structure 204 and the semiconductor substrate 102 and conformallydisposed between the dielectric layer 106 and the back-side 102 b of thesemiconductor substrate 102. In some embodiments, the epitaxial layer122 has angled lower surfaces 122L that are disposed between theback-side 102 b of the semiconductor substrate 102 and the well region107. Although the epitaxial layer 122 has angled lower surfaces 122Lthat are disposed between the back-side 102 b of the semiconductorsubstrate 102 and the well region 107, the second doped regions 124 maystill extend into the well region 107. In other embodiments, the seconddoped regions 124 may not extend into the well region 107.

As shown in FIG. 2C, the epitaxial layer 122 extends from the back-side102 b of the semiconductor substrate 102 into the well region 107, suchthat sidewalls of the epitaxial layer 122 extend into the well region107. In some embodiments, the epitaxial layer 122 has a substantiallyrounded lower surface disposed beneath the BDTI structure 204. Further,the epitaxial layer 122 has lower angled sidewalk that extend from thesubstantially rounded lower surface outward in opposite lateraldirections from one another and vertically toward the back-side 102 b ofthe semiconductor substrate 102. Moreover, the epitaxial layer 122 hasangled upper sidewalk that extend from the angled lower sidewalls inwardin opposite lateral directions toward one another and vertically to theback-side 102 b of the semiconductor substrate 102. In some embodiments,the angled upper sidewalls extend inward at a greater angle than thelower angled sidewalls extend outward. In further embodiments, the lowerangled sidewalls of the epitaxial layer 122 contact the second dopedregions 124 and the well region 107. In such embodiments, the roundedlower surface of the epitaxial layer 122 may contact the well region107.

FIG. 3 illustrates a cross-sectional view of some embodiments of aback-side illumination CMOS (BSI-CMOS) image sensor 300 comprising asecond doped region disposed between a first doped region and adielectric layer to improve full well capacity.

The BSI-CMOS image sensor 300 comprises a pixel sensor 301 (e.g., anactive pixel sensor). The pixel sensor 301 comprises a photodetector 103disposed in a semiconductor substrate 102. In some embodiments, thesemiconductor substrate 102 may comprise, for example, a bulk siliconsubstrate, a silicon-on-insulator (SOI) substrate, or some othersemiconductor substrate. In further embodiments, the photodetector 103comprises a first doped region 104 having a first doping type (e.g.,n-type doping). In yet further embodiments, a well region 107 having asecond doping type (e.g., p-type doping) is disposed in thesemiconductor substrate 102 near a front-side 102 f of the semiconductorsubstrate 102.

A transfer transistor 306 is disposed over the front-side 102 f of thesemiconductor substrate 102. The transfer transistor 306 comprises agate dielectric layer 308 disposed over the front-side 102 f of thesemiconductor substrate 102, and a gate electrode 310 disposed on thegate dielectric layer 308. In some embodiments, sidewall spacers 312 aredisposed on opposing sides of the gate electrode 310 and opposingsidewalls of the gate dielectric layer 308. The transfer transistor 306is configured to transfer accumulated charge in the first doped region104 to a floating diffusion node 314. In further embodiments, thetransfer transistor 306 may be isolated from adjacent transfertransistors (not shown) by one or more isolation structures 304 (e.g.,shallow trench isolation (STI) structures) disposed in the well region107 on opposing sides of the transfer transistor 306. The one or moreisolation structures 304 may comprise a dielectric material, forexample, an oxide (e.g., silicon dioxide (SiO₂)), a nitride, anoxy-nitride, or the like.

An ILD layer 112 is disposed on the front-side 102 f of thesemiconductor substrate 102. In some embodiments, the ILD layer 112comprises one or more ILD materials. In further embodiments, the ILDlayer 112 may comprise one or more of a low-k dielectric layer (e.g., adielectric with a dielectric constant less than about 3.9), anultra-low-k dielectric layer, or an oxide (e.g., SiO₂). Conductivecontacts 316 are disposed in the ILD layer 112. The conductive contacts316 extend from the gate electrode 310 and the floating diffusion node314 to one or more metal wire layers (not shown). In variousembodiments, the conductive contacts 316 may comprise, for example,copper, tungsten, or some other conductive material.

A dielectric layer 106 is disposed over a back-side 102 b of thesemiconductor substrate 102. A plurality of regions of the dielectriclayer 106 extend from the back-side 102 b of the semiconductor substrate102 into the semiconductor substrate 102 on opposing sides of thephotodetector 103. The dielectric layer 106 vertically separates aplurality of color filters 116 a-116 c from the back-side 102 b of thesemiconductor substrate 102. In some embodiments, the plurality of colorfilters 116 a-116 c may be arranged in a grid structure 320 disposedover the dielectric layer 106. In some embodiments, the grid structure320 may comprise a stacked grid having a metal framework surrounded by adielectric material. In further embodiments, the dielectric layer 106and the dielectric material of the grid structure 320 may comprise asame dielectric material (e.g., SiO₂).

A plurality of micro-lenses 120 are disposed over the plurality of colorfilters 116 a-116 c, respectively. In some embodiments, the micro-lenses120 have substantially planar bottom surfaces contacting the pluralityof color filters 116 a-116 c, respectively. In further embodiments, themicro-lenses 120 have curved upper surface. In such embodiments, thecurved upper surface of one of the micro-lenses 120 is configured tofocus incident radiation towards the underlying photodetector 103.

Back-side deep trench isolation (BDTI) structures 204 are disposed inthe semiconductor substrate 102 and extend from the back-side 102 b ofthe semiconductor substrate 102 into the semiconductor substrate 102 onopposite sides of the photodetector 103. The BDTI structures 204comprise the plurality of regions of the dielectric layer 106 thatextend into the semiconductor substrate 102 on opposing sides of thephotodetector 103, respectively. In some embodiments, the BDTIstructures 204 comprise, for example, an oxide (e.g., SiO₂), a nitride,an oxy-nitride, or the like.

An epitaxial layer 122 is disposed between the dielectric layer 106 andthe semiconductor substrate 102, such that the BDTI structures 204 andthe dielectric layer 106 are separated from the semiconductor substrate102 by the epitaxial layer 122. In some embodiments, the epitaxial layer122 may have an opposite doping type as the first doped region 104. Infurther embodiments, the epitaxial layer 122 may comprise silicon (Si)and one or more dopants, for example, boron (B), phosphorous (P), carbon(C), some other suitable dopant, or a combination of the forgoing. Infurther embodiments, the one or more dopants have an opposite dopingtype (e.g., p-type doping) than the first doped region 104.

A second doped region 124 is disposed in the semiconductor substrate 102between the first doped region 104 and the epitaxial layer 122. In someembodiments, the second doped region 124 extends vertically alongsidewalls of the epitaxial layer 122 and laterally along a lower surfaceof the epitaxial layer 122. In further embodiments, the second dopedregion 124 comprises the same doping type (e.g., p-type doping) as thewell region 107. In further embodiments, the second doped region 124comprises the same one or more dopants (e.g., boron (B), carbon (C),etc.) as the epitaxial layer 122. In further embodiments, the seconddoped region 124 comprises a different doping concentration than thewell region 107. In other embodiments, the second doped region 124comprise a substantially similar doping concentration as the well region107.

During operation of the BSI-CMOS image sensor 300, incident radiation isfocused by one of the micro-lens 120 to the underlying photodetector103. When incident radiation of sufficient energy strikes thephotodetector 103, it generates an electron-hole pair that produces aphotocurrent. The transfer transistor 306 controls charge transfer fromthe photodetector 103 to the floating diffusion node 314. If the chargelevel is sufficiently high in the floating diffusion node 314 (or ifsome predetermined time for collector charge is met), a source followertransistor 322 is activated and charges are selectively output accordingto operation of a row select transistor 324 used for addressing. A resettransistor 326 is configured to reset the photodetector 103 betweenexposure periods.

FIG. 4 illustrates a cross-sectional view of some embodiments of astacked CMOS image sensor 400 comprising the back-side illumination CMOS(BSI-CMOS) image sensor 300 of FIG. 3 coupled to a second integratedchip (IC) 403.

As shown in FIG. 4 , the BSI-CMOS image sensor 300 comprises aninterconnect structure 108 disposed on the front-side 102 f of thesemiconductor substrate 102. In some embodiments, the interconnectstructure 108 comprises an upper passivation layer 401 disposed on theILD layer 112. A plurality of conductive features 110 (e.g., conductivelines and conductive vias) are disposed in the ILD layer 112 andelectrically coupled to the conductive contacts 316. In someembodiments, a plurality of contact pads 402 are disposed in the upperpassivation layer 401 and are electrically coupled to the plurality ofconductive features 110. In further embodiments, the contact pads 402may comprise, for example, aluminum, gold, copper, or some otherconductive material. In yet further embodiments, the upper passivationlayer 401 may comprise, for example, an oxide, a nitride, andoxy-nitride, a polymer, or some other dielectric material.

The second IC 403 comprises a semiconductor device. In some embodiments,the semiconductor device is a metal-oxide-semiconductor field-effecttransistor (MOSFET) 404 disposed on a front-side 406 f of a secondsemiconductor substrate 406. In some embodiments, the secondsemiconductor substrate 406 may comprise, for example, asilicon-on-insulator (SOT) substrate, or some other semiconductorsubstrate. In further embodiments, the MOSFET 404 comprises a pair ofsource/drain regions 408 disposed in the second semiconductor substrate406, a MOSFET gate dielectric layer 410 disposed over the front-side 406f of the second semiconductor substrate 406, and a MOSFET gate electrode412 disposed on the MOSFET gate dielectric layer 410. In someembodiments, MOSFET sidewall spacers 413 are disposed on opposing sidesof the MOSFET gate electrode 412 and opposing sidewalls of the MOSFETgate dielectric layer 410. In yet further embodiments, the second IC 403is an application-specific integrated circuit (ASIC) configured toprocess electrical signals received from the BSI-CMOS image sensor 300.

A second IC interconnect structure 414 is disposed over the front-side406 f of the second semiconductor substrate 406. The second ICinterconnect structure 414 comprises a second IC ILD layer 416 disposedon the front-side 406 f of the second semiconductor substrate 406. Insome embodiments, the second IC ILD layer 416 may comprise one or moreof a low-k dielectric layer (e.g., a dielectric with a dielectricconstant less than about 3.9), an ultra-low-k dielectric layer, or anoxide (e.g., SiO₂). A plurality of second IC conductive contacts 418 aredisposed in the second IC ILD layer 416. In some embodiments, the secondIC conductive contacts 418 extend from the MOSFET gate electrode 412 andthe pair of source/drain regions 408 to a plurality of second ICconductive features 420 (e.g., conductive lines and conductive vias)disposed in the second IC ILD layer 416.

In some embodiments, the second IC interconnect structure 414 comprisesa second IC upper passivation layer 422 disposed on the second IC ILDlayer 416. A plurality of second IC contact pads 424 are disposed in thesecond IC upper passivation layer 422 and are electrically coupled tothe second IC conductive features 420. In further embodiments, thesecond IC interconnect structure 414 is bonded (e.g., by eutecticbonding, by hybrid bonding, etc.) to the interconnect structure 108,such that the MOSFET 404 is electrically coupled to the BSI-CMOS imagesensor 300.

FIGS. 5-13 illustrate a series of cross-sectional views of someembodiments for forming a stacked CMOS image sensor comprising a seconddoped region disposed between a first doped region and a dielectriclayer to improve full well capacity.

As shown in FIG. 5 , a doped area 502 is formed in a semiconductorsubstrate 102. In further embodiments, the doped area 502 is a region ofthe semiconductor substrate 102 comprising a first doping type (e.g.,n-type doping). In yet further embodiments, the doped area 502 may beformed by a blanket ion implantation process (e.g., an unmasked ionimplantation) to implant ions into the semiconductor substrate 102. Inother embodiments, the doped area 502 may be formed by a selective ionimplantation process that utilizes a masking layer (not shown) on afront-side 102 f of the semiconductor substrate 102 to selectivelyimplant ions into the semiconductor substrate 102.

Also shown in FIG. 5 , a well region 107 is formed in the semiconductorsubstrate 102. In some embodiments, the well region 107 is a region ofthe semiconductor substrate 102 having a second doping type (e.g.,p-type doping) opposite the first doping type. In further embodiments,the well region 107 is formed in contact with the doped area 502. In yetfurther embodiments, the well region 107 may be formed by a blanket ionimplantation process to implant ions into the semiconductor substrate102. In other embodiments, the well region 107 may be formed by aselective ion implantation process that utilizes a masking layer (notshown) on the front-side 102 f of the semiconductor substrate 102 toselectively implant ions into the semiconductor substrate 102.

As shown in FIG. 6 , isolation structures 304 (e.g., shallow trenchisolation (STI) structures) are formed in the semiconductor substrate102. In some embodiments, the isolation structures 304 may be formed byselectively etching the semiconductor substrate 102 to form a trench inthe semiconductor substrate 102, and subsequently filing the trench witha dielectric material. In further embodiments, the semiconductorsubstrate 102 is selectively etched by forming a masking layer (notshown) over the semiconductor substrate 102, and subsequently exposingthe semiconductor substrate 102 to an etchant configured to selectivelyremove unmasked portions of the semiconductor substrate 102. In furtherembodiments, the dielectric material may be deposited or grown by, forexample, physical vapor deposition (PVD), chemical vapor deposition(CVD), sputtering, thermal oxidation, or some other deposition or growthprocess. In yet further embodiments, the dielectric material maycomprise an oxide (e.g., silicon dioxide (SiO₂)), a nitride, a carbide,or the like.

Also shown in FIG. 6 , a transfer transistor 306 is formed on afront-side 102 f of the semiconductor substrate 102. The transfertransistor 306 may be formed by depositing a gate dielectric film and agate electrode film over the semiconductor substrate 102. The gatedielectric film and the gate electrode film are subsequently patternedto form a gate dielectric layer 308 and a gate electrode 310,respectively. Further, sidewall spacers 312 may be formed on opposingsidewalls of the gate electrode 310 and opposing sidewalls of the gatedielectric layer 308. In some embodiments, the sidewall spacers 312 maybe formed by conformally depositing a nitride onto the front-side 102 fof the semiconductor substrate 102 and etching back the nitride using avertical etch to form the sidewall spacers 312. Moreover, a floatingdiffusion node 314 is formed in the semiconductor substrate 102. Thefloating diffusion node 314 is a region of the semiconductor substrate102 having an opposite doping type than the well region 107. In someembodiments, the floating diffusion node 314 may be formed by aselective ion implantation process that utilizes a masking layer (notshown) on the front-side 102 f of the semiconductor substrate 102 toselectively implant ions into the semiconductor substrate 102.

As shown in FIG. 7 , an interconnect structure 108 is formed over thefront-side 102 f of the semiconductor substrate 102. The interconnectstructure 108 comprises conductive contacts 316 and a plurality ofconductive features 110 (e.g., conductive lines and conductive vias)disposed in an ILD layer 112. In some embodiments, the ILD layer 112,which may comprise one or more dielectric layers, is formed over thefront-side 102 f of the semiconductor substrate 102. The ILD layer 112is subsequently etched to form via holes and/or conductive linetrenches. The via holes and/or conductive line trenches are then filledwith a conductive material (e.g., copper, aluminum, tungsten, etc.) toform the plurality of conductive contacts 316 and the plurality ofconductive features 110. In some embodiments, the ILD layer 112 may bedeposited or grown by, for example, PVD, CVD, sputtering, thermaloxidation, or some other deposition or growth process. The conductivecontacts 316 and conductive features 110 may be formed by, for example,PVD, CVD, electrochemical plating, electroless plating, or some otherdeposition process.

In further embodiments, the interconnect structure 108 comprises contactpads 402 disposed in an upper passivation layer 401 that is disposed onthe ILD layer 112. In some embodiments, the upper passivation layer 401may be formed on the ILD layer 112, and subsequently etched to formopenings in the upper passivation layer 401. The openings are thenfilled with a conductive material to form the contact pads 402. In someembodiments, the upper passivation layer 401 may be deposited by, forexample, PVD, CVD, sputtering, or some other deposition process. Thecontact pads 402 may be formed by, for example, PVD, CVD,electrochemical plating, electroless plating, or some other depositionprocess.

As shown in FIG. 8 , the interconnect structure 108 is bonded to asecond integrated chip (IC) 403 comprising a second IC interconnectstructure 414. In some embodiments, the second IC interconnect structure414 is formed over a front-side 406 f of a second semiconductorsubstrate 406. Subsequently, the interconnect structure 108 is bonded tothe second IC interconnect structure 414 by, for example, eutecticbonding, hybrid bonding, or some other bonding process.

In some embodiments, the second IC 403 comprises ametal-oxide-semiconductor field-effect transistor (MOSFET) 404. TheMOSFET 404 is disposed on the front-side 406 f of the secondsemiconductor substrate 406. The MOSFET 404 comprises a MOSFET gatedielectric layer 410 disposed on the front-side 406 f of the secondsemiconductor substrate 406, and a MOSFET gate electrode 412 disposed onthe MOSFET gate dielectric layer 410. A pair of source/drain regions 408are disposed on opposite sides of the MOSFET gate dielectric layer 410.In some embodiments, MOSFET sidewall spacers 413 are disposed onopposing sides of the MOSFET gate electrode 412 and opposing sidewallsof the MOSFET gate dielectric layer 410. In further embodiments, aprocess for forming the MOSFET 404 may comprise a substantially similarprocess for forming the transfer transistor 306.

In some embodiments, the second IC interconnect structure 414 comprisesa second IC ILD layer 416 disposed on the front-side 406 f of the secondsemiconductor substrate 406. Second IC conductive contacts 418 aredisposed in the second IC ILD layer 416. In some embodiments, the secondIC conductive contacts 418 extend from the MOSFET gate electrode 412 andthe pair of source/drain regions 408 to a plurality of second ICconductive features 420 (e.g., conductive lines and conductive vias)disposed in the second IC ILD layer 416. In some embodiments, the secondIC interconnect structure 414 comprises a second IC upper passivationlayer 422 disposed on the second IC ILD layer 416. A plurality of secondIC contact pads 424 are disposed in the second IC upper passivationlayer 422 and electrically coupled to the plurality of second ICconductive features 420. In further embodiments, a process for formingthe second IC interconnect structure 414 may comprise a substantiallysimilar process for forming the interconnect structure 108 of theBSI-CMOS image sensor 300.

As shown in FIG. 9 , the semiconductor substrate 102 is selectivelyetched to form initial deep trenches 902 a-902 b in the back-side 102 bof the semiconductor substrate 102. In some embodiments, the initialdeep trenches 902 a-902 b extend from the back-side 102 b of thesemiconductor substrate 102 to first points in the semiconductorsubstrate 102, respectively, that are disposed over the well region 107(e.g., between the well region 107 and the back-side 102 b of thesemiconductor substrate 102). In other embodiments, the initial deeptrenches 902 a-902 b may extend from the back-side 102 b of thesemiconductor substrate 102 to second points in the semiconductorsubstrate 102, respectively, that are disposed in the well region 107.

In some embodiments, a process for forming the initial deep trenches 902a-902 b comprises forming a masking layer (not shown) on the back-side102 b of the semiconductor substrate 102. The masking layer (not shown)may be formed on the back-side 102 b of the semiconductor substrate 102by flipping (e.g., rotating the semiconductor substrate 180 degrees) thesemiconductor substrate 102, such that the masking layer (not shown) maybe formed on the back-side 102 b of the semiconductor substrate 102. Theback-side 102 b of the semiconductor substrate 102 is then exposed to afirst etchant 904 that removes portions of the semiconductor substrate102 not exposed by the masking layer to form the initial deep trenches902 a-902 b in the semiconductor substrate 102. In some embodiments, thefirst etchant is diluted hydrofluoric acid (DHF).

As shown in FIG. 10 , the semiconductor substrate 102 is etched to formextended deep trenches 1002 a-1002 b in the back-side 102 b of thesemiconductor substrate 102. In some embodiments, the extended deeptrenches 1002 a-1002 b extend from the back-side 102 b of thesemiconductor substrate 102 to third points in the semiconductorsubstrate 102, respectively, that are disposed over the well region 107(e.g., between the well region 107 and the back-side 102 b of thesemiconductor substrate 102). In such embodiments, the third points maybe disposed between the first points and the well region 107. In otherembodiments, the extended deep trenches 1002 a-1002 b may extend tofourth points in the semiconductor substrate 102, respectively, that aredisposed in the well region 107. In such embodiments, the fourth pointsmay be disposed between the second points and the front-side 102 f ofthe semiconductor substrate 102.

In some embodiments, the extended deep trenches 1002 a-1002 b havesubstantially rounded lower surfaces. In other embodiments, the extendeddeep trenches 1002 a-1002 b have angled lower surfaces along the <111>crystal plane of the semiconductor substrate 102. Further, the extendeddeep trenches 1002 a-1002 b have lower angled sidewalls thatrespectively extend from the sustainably rounded lower surfaces outwardin opposite lateral directions from one another and vertically towardthe back-side 102 b of the semiconductor substrate 102. Moreover, theextended deep trenches 1002 a-1002 b have angled upper sidewalls thatrespectively extend from the angled lower sidewalls inward in oppositelateral directions toward one another and vertically to the back-side102 b of the semiconductor substrate 102. In some embodiments, theangled upper sidewalls extend inward at a greater angle than the lowerangled sidewalls extend outward.

In some embodiments, a process for forming the extended deep trenches1002 a-1002 b comprises forming a masking layer (not shown) on theback-side 102 b of the semiconductor substrate 102. Subsequently, theback-side 102 b of the semiconductor substrate 102 is exposed to asecond etchant 1004 that removes portions of the semiconductor substrate102 not exposed by the masking layer to form the extended deep trenches1002 a-1002 b. In some embodiments, the second etchant istetramethylammonium hydroxide (TMAH).

As shown in FIG. 11 , an epitaxial layer 122 is formed on the back-side102 b of the semiconductor substrate 102 and lining the extended deeptrenches 1002 a-1002 b. In some embodiments, the epitaxial layer 122 isformed conformally on the back-side of the semiconductor substrate 102and conformally lining the extended deep trenches 1002 a-1002 b. Infurther embodiments, the epitaxial layer 122 comprises silicon (Si) anda dopant (e.g., boron (B), carbon (C), etc.) having the second dopingtype (e.g., p-type doping).

In some embodiments, a process for forming the epitaxial layer 122comprises a non-selective low-temperature epitaxial growth process. Thenon-selective low-temperature epitaxial growth process comprises heatingthe semiconductor substrate 102 in a processing chamber, and flowing aprecursor compound and a dopant compound into the processing chamber tofrom the epitaxial layer 122. In some embodiments, the precursorcompound comprises, for example, disilane (Si₂H₆), trisilane (Si₃H₆), orsome other high-order silane(s). In further embodiments, the dopantcompound may comprise diborane (B₂H₆).

In various embodiments, the non-selective low-temperature epitaxialgrowth process is performed in an environment having a temperature belowabout 500° C. and a pressure between about 5 Torr and about 12 Torr.Because the semiconductor substrate 102 is bonded to a second IC 403,the non-selective low-temperature epitaxial growth process is performedbelow about 500° C. to ensure the epitaxial layer 122 is formed over theback-side 102 b of the semiconductor substrate 102 and lining theextended deep trenches 1002 a-1002 b without damaging the transfertransistor 306 and/or the MOSFET 404. In some embodiments, before theepitaxial layer 122 is formed, a baking process is performed on thesemiconductor substrate 102 to remove impurities from the semiconductorsubstrate 102. The baking process may be performed in a hydrogen gas(H₂) environment at a temperature below about 500° C. and a pressurebelow about 2 Torr for about 10 minutes.

Also shown in FIG. 11 , a second doped region 124 is formed in thesemiconductor substrate 102 between the doped area 502 (see, e.g., FIG.10 ) and the epitaxial layer 122. In some embodiments, the second dopedregion 124 is formed conformally along the epitaxial layer 122. Infurther embodiments, the second doped region 124 extends into the wellregion 107. In further embodiments, the second doped region 124 isformed in the semiconductor substrate 102 by driving the dopant of theepitaxial layer 122 into the semiconductor substrate 102. In yet furtherembodiments, forming the second doped region 124 forms a photodetector103 in the semiconductor substrate 102. In some embodiments, thephotodetector 103 comprises a first doped region 104 and a p-n junctionthat exists between the first doped region 104 and the second dopedregion 124. In such embodiments, the first doped region 104 may be aportion of the doped area 502 (see, e.g., FIG. 10 ) disposed between thesecond doped region 124 and the well region 107.

In some embodiments, the dopant of the epitaxial layer 122 is driveninto the semiconductor substrate 102 during formation of the epitaxiallayer 122. In further embodiments, after the epitaxial layer 122 isformed, an anneal process (e.g., rapid thermal anneal, microwave anneal,etc.) may be performed to drive the dopant into the semiconductorsubstrate 102. In further embodiments, the anneal process may beperformed in-situ with the epitaxial process and in an environmenthaving a temperature below about 500° C. and a pressure below about 2Torr. In other embodiments, the anneal process may be an ex-situprocess.

Driving the dopant of the epitaxial layer 122 into the semiconductorsubstrate 102 to form the second doped region 124 provides greatercontrol over the profile of the first doped region 104 than utilizing aselective ion implantation process (e.g., prior to the formation of thetransfer transistor 306) to define the profile of the first doped region104. For example, the dopant may be driven into the semiconductorsubstrate 102 to form the second doped region 124 between the firstdoped region 104 and the epitaxial layer 122. On the other hand, if thefirst doped region 104 is formed by the selective ion implantationprocess, a size of the first doped region 104 may be undesirably reduceddue to the difficulty in controlling the profile of the first dopedregion 104. Thus, driving the dopant of the epitaxial layer 122 into thesemiconductor substrate 102 to form the second doped region 124 mayincrease the size of the first doped region 104. Accordingly,performance of the stacked CMOS image sensor may be improved byincreasing the full well capacity of the photodetector 103.

As shown in FIG. 12 , a dielectric layer 106 is formed over theepitaxial layer 122 and in the extended deep trenches 1002 a-1002 b,such that portions of the dielectric layer 106 that extend into the deeptrenches 1002 a-1002 b form back-side deep trench isolation (BDTI)structures 204. In some embodiments, the dielectric layer 106 is formedon the epitaxial layer 122, such that the epitaxial layer 122continuously contacts the dielectric layer 106 along the BDTI structures204 and continuously along the back-side 102 b of the semiconductorsubstrate 102. In further embodiments, the second doped region 124 isdisposed between the first doped region 104 and the BDTI structures 204and between the first doped region 104 and the dielectric layer 106. Inyet further embodiments, a process for forming the dielectric layercomprises, for example, CVD, PVD, sputtering, thermal oxidation, or someother deposition or growth process.

Because the second doped region 124 is disposed between the first dopedregion 104 and the BDTI structures 204 (and the dielectric layer 106)and because the second doped region 124 comprises an opposite dopingtype as the first doped region 104, the second doped region 124 mayisolate, (e.g., by p-n junction isolation) the first doped region 104from the BDTI structures 204 and/or the dielectric layer 106. Thus,without increasing manufacturing complexities (e.g., an additionaldeposition process to deposit a high-k dielectric layer between thedielectric layer 106 and the semiconductor substrate 102), the seconddoped region 124 may improve dark current performance and/or white pixelnumbers of the stacked CMOS image sensor by preventing noise signalscaused by the BDTI structures 204 (e.g., Si—SiO₂ interface traps) or thedielectric layer 106 from being collected by the photodetector 103.Accordingly, the cost to manufacture the stacked CMOS image sensor maybe reduced.

As shown in FIG. 13 , a plurality of color filters 116 a-116 c areformed over the back-side 102 b of the semiconductor substrate 102. Insome embodiments, the plurality of color filters 116 a-116 c may beformed by forming a color filter layer and patterning the color filterlayer. The color filter layer is formed of a material that allows forthe transmission of radiation (e.g., light) having a specific range ofwavelength, while blocking light of wavelengths outside of the specifiedrange. Further, in some embodiments, the color filter layer isplanarized subsequent to formation.

A plurality of micro-lenses 120 is formed over the plurality of colorfilters 116 a-116 c. In some embodiments, the plurality of micro-lenses120 may be formed by depositing a micro-lens material above theplurality of color filters 116 a-116 c (e.g., by a spin-on method or adeposition process). A micro-lens template (not shown) having a curvedupper surface is patterned above the micro-lens material. In someembodiments, the micro-lens template may comprise a photoresist materialexposed using a distributing exposing light dose (e.g., for a negativephotoresist more light is exposed at a bottom of the curvature and lesslight is exposed at a top of the curvature), developed and baked to forma rounding shape. The plurality of micro-lenses 120 are then formed byselectively etching the micro-lens material according to the micro-lenstemplate.

As illustrated in FIG. 14 , a flowchart 1400 of some embodiments of amethod for forming a stacked CMOS image sensor comprising a second dopedregion disposed between a first doped region and a dielectric layerhaving to improve full well capacity is provided. While the flowchart1400 of FIG. 14 is illustrated and described herein as a series of actsor events, it will be appreciated that the illustrated ordering of suchacts or events is not to be interpreted in a limiting sense. Forexample, some acts may occur in different orders and/or concurrentlywith other acts or events apart from those illustrated and/or describedherein. Further, not all illustrated acts may be required to implementone or more aspects or embodiments of the description herein, and one ormore of the acts depicted herein may be carried out in one or moreseparate acts and/or phases.

At 1402, a doped area and a well region are formed in a semiconductorsubstrate. FIG. 5 illustrates a cross-sectional view of some embodimentscorresponding to act 1402.

At 1404, a transfer transistor is formed over a front-side of thesemiconductor substrate. FIG. 6 illustrates a cross-sectional view ofsome embodiments corresponding to act 1404.

At 1406, an interconnect structure is formed on the front-side of thesemiconductor substrate and over the transfer transistor. FIG. 7illustrates a cross-sectional view of some embodiments corresponding toact 1406.

At 1408, a second integrated chip (IC) is bonded to the interconnectstructure. FIG. 8 illustrates a cross-sectional view of some embodimentscorresponding to act 1408.

At 1410, a back-side of the semiconductor substrate is etched to forminitial deep trenches in the semiconductor substrate. FIG. 9 illustratesa cross-sectional view of some embodiments corresponding to act 1410.

At 1412, the back-side of the semiconductor substrate is etched to formextended deep trenches in the semiconductor substrate. FIG. 10illustrates a cross-sectional view of some embodiments corresponding toact 1412.

At 1414, an epitaxial layer is formed over the back-side of thesemiconductor substrate and lining the extended deep trenches. FIG. 11illustrates a cross-sectional view of some embodiments corresponding toact 1414.

At 1416, a second doped region is formed in the semiconductor substratealong the epitaxial layer, wherein the second doped region is disposedbetween a first doped region of a photodetector and the epitaxial layer.FIG. 11 illustrates a cross-sectional view of some embodimentscorresponding to act 1416.

At 1418, a dielectric layer is formed over the epitaxial layer and inthe extended deep trenches to form back-side deep trench isolation(BDTI) structures on opposing sides of the photodetector, wherein thesecond doped region is disposed between the first doped region and thedielectric layer and between the first doped region and the BDTIstructures. FIG. 12 illustrates a cross-sectional view of someembodiments corresponding to act 1418.

At 1420, a plurality of color filters and micro-lens are formed over theback-side of the semiconductor substrate. FIG. 13 illustrates across-sectional view of some embodiments corresponding to act 1420.

In some embodiments, the present application provides a method forforming an image sensor. The method includes forming a plurality oftrenches in a semiconductor substrate, where the trenches extend intothe semiconductor substrate from a back-side of the semiconductorsubstrate. An epitaxial layer comprising a dopant is formed on lowersurfaces of the trenches, sidewalls of the trenches, and the back-sideof the semiconductor substrate, where the dopant has a first dopingtype. The dopant is driven into the semiconductor substrate to form afirst doped region having the first doping type along the epitaxiallayer, wherein the first doped region separates a second doped regionhaving a second doping type opposite the first doping type from thesidewalls of the trenches and from the back-side of the semiconductorsubstrate. A dielectric layer is formed over the back-side of thesemiconductor substrate, where the dielectric layer fills the trenchesto form back-side deep trench isolation (BDTI) structures.

In other embodiments, the present application provides a complementarymetal-oxide-semiconductor (CMOS) image sensor. The CMOS image sensorincludes a first photodetector and a second photodetector disposed in asemiconductor substrate. A dielectric layer is disposed over a back-sideof the semiconductor substrate, where the dielectric layer extends intothe semiconductor substrate from the back-side of the semiconductorsubstrate between the first photodetector and the second photodetectorto define a back-side trench isolation (BDTI) structure. An epitaxiallayer is disposed between the BDTI structure and the semiconductorsubstrate. First doped regions are disposed in the semiconductorsubstrate, where the first doped regions extend along the epitaxiallayer on opposite sides of the BDTI structure.

In yet other embodiments, the present application provides a method forforming a complementary metal-oxide-semiconductor (CMOS) image sensor.The method includes forming a first interconnect structure over afront-side of a first semiconductor wafer. A second interconnectstructure is formed over a front-side of a second semiconductor wafer.The first interconnect structure is bonded to the second interconnectstructure. After the first and second interconnect structures arebonded, a plurality of trenches are formed in the first semiconductorwafer, where the trenches extend into the first semiconductor wafer froma back-side of the first semiconductor wafer opposite the front-side ofthe first semiconductor wafer. An epitaxial layer is formed lining thetrenches and the back-side of the first semiconductor wafer. Aphotodetector is formed in the first semiconductor wafer between thetrenches. The trenches are filled with a dielectric layer to formback-side deep trench isolation (BDTI) structures in the firstsemiconductor wafer, where the dielectric layer extends over theback-side of the first semiconductor wafer, and where the epitaxiallayer continuously contacts the first semiconductor wafer and thedielectric layer along sidewalls of the BDTI structures, along lowersurfaces of the BDTI structures, and along the back-side of the firstsemiconductor wafer.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. An image sensor comprising: a photodetectordisposed in a semiconductor substrate, wherein the photodetectorcomprises a first doped region in the semiconductor substrate; a fillermaterial disposed over a back-side of the semiconductor substrate,wherein a first portion of the filler material extends into thesemiconductor substrate to define a first back-side trench isolation(BDTI) structure, a second portion of the filler material extends intothe semiconductor substrate to define a second BDTI structure, and athird portion of the filler material extends from the first portion ofthe filler material to the second portion of the filler material, andwherein the first BDTI structure and the second BDTI structure aredisposed on opposite sides of the first doped region; an epitaxialstructure lining the filler material and the semiconductor substrate,wherein the epitaxial structure is a semiconductor material, and whereinthe filler material contacts the epitaxial structure; and a second dopedregion disposed in the semiconductor substrate and between the epitaxialstructure and the first doped region, wherein the second doped regionhas an opposite doping type as the first doped region.
 2. The imagesensor of claim 1, wherein the filler material has a same chemicalcomposition in the first portion of the filler material, the secondportion of the filler material, and the third portion of the fillermaterial.
 3. The image sensor of claim 1, wherein the epitaxialstructure contacts both the filler material and the semiconductorsubstrate.
 4. The image sensor of claim 1, wherein the third portion ofthe filler material contacts the epitaxial structure between oppositesides of the photodetector.
 5. The image sensor of claim 1, wherein theepitaxial structure contacts the first portion of the filler material,the second portion of the filler material, and the third portion of thefiller material.
 6. The image sensor of claim 1, wherein: the epitaxialstructure contacts both the first portion of the filler material and thesemiconductor substrate; the epitaxial structure contacts both thesecond portion of the filler material and the semiconductor substrate;and the epitaxial structure contacts both the third portion of thefiller material and the semiconductor substrate.
 7. The image sensor ofclaim 1, wherein the third portion of the filler material has asubstantially planar uppermost surface that extends laterally from afirst side of the first BDTI structure to a second side of the firstBDTI structure opposite the first side of the first BDTI structure. 8.The image sensor of claim 7, wherein the substantially planar uppermostsurface of the third portion of the filler material also extendslaterally over the photodetector and the second BDTI structure.
 9. Animage sensor comprising: a first photodetector disposed in asemiconductor substrate, wherein the first photodetector comprises afirst doped region having a first doping type; a second photodetectordisposed in the semiconductor substrate, wherein the secondphotodetector comprises a second doped region having the first dopingtype; a back-side trench isolation (BDTI) structure disposed in thesemiconductor substrate and between the first doped region and thesecond doped region, wherein the BDTI structure is defined by a portionof a filler material that extends into the semiconductor substrate froma back-side of the semiconductor substrate; an epitaxial structurelining the BDTI structure and the semiconductor substrate, wherein theepitaxial structure is a semiconductor material, wherein the portion ofthe filler material contacts the epitaxial structure, wherein theepitaxial structure has a first sidewall and a second sidewall that faceone another, and wherein the portion of the filler material extendscontinuously from the first sidewall of the epitaxial structure to thesecond sidewall of the epitaxial structure; and a third doped regiondisposed in the semiconductor substrate and extending along theepitaxial structure, wherein the third doped region has a second dopingtype opposite the first doping type.
 10. The image sensor of claim 9,wherein: a segment of the portion of the filler material extendscontinuously from the first sidewall of the epitaxial structure to thesecond sidewall of the epitaxial structure; and the segment of thefiller material is substantially aligned with the back-side of thesemiconductor substrate.
 11. The image sensor of claim 9, wherein achemical composition of the filler material is the same from the firstsidewall to the second sidewall.
 12. The image sensor of claim 9,wherein: the epitaxial structure comprises a third sidewall, a fourthsidewall, and a lower surface; the third sidewall is opposite the fourthsidewall; both the first sidewall and the second sidewall are disposedbetween the third sidewall and the fourth sidewall; and the lowersurface is a rounded surface that extends from the third sidewall to thefourth sidewall.
 13. The image sensor of claim 12, wherein the thirdsidewall and the fourth sidewall are angled.
 14. The image sensor ofclaim 13, wherein: the epitaxial structure comprises a fifth sidewalland a sixth sidewall; the fifth sidewall extends from the third sidewallto the back-side of the semiconductor substrate; the sixth sidewallextends from the fourth sidewall to the back-side of the semiconductorsubstrate; the third sidewall and the fourth sidewall angle outward froma centerline of the BDTI structure; and the fifth sidewall and the sixthsidewall angle inward toward the centerline of the BDTI structure. 15.The image sensor of claim 9, wherein: the epitaxial structure comprisesa third sidewall, a fourth sidewall, a first lower surface, and a secondlower surface; the third sidewall is opposite the fourth sidewall; thethird sidewall and the fourth sidewall are substantially vertical; thefirst lower surface extends at a first angle from the third sidewall toa point; and the second lower surface extends at a second angle from thefourth sidewall to the point.
 16. The image sensor of claim 15, wherein:the epitaxial structure has a first thickness along the third sidewall;the epitaxial structure has a second thickness along the first lowersurface; and the second thickness is greater than the first thickness.17. The image sensor of claim 15, wherein: the epitaxial structurecomprises a fifth sidewall and a sixth sidewall; the fifth sidewallextends from the third sidewall to the back-side of the semiconductorsubstrate; the sixth sidewall extends from the fourth sidewall to theback-side of the semiconductor substrate; the first lower surface andthe second lower surface extend outward from the point; and the fifthsidewall and the sixth sidewall extend inward toward the point.
 18. Animage sensor comprising: a first photodetector disposed in asemiconductor substrate, wherein the first photodetector comprises afirst doped region having a first doping type; a second photodetectordisposed in the semiconductor substrate, wherein the secondphotodetector comprises a second doped region having the first dopingtype; a back-side trench isolation (BDTI) structure disposed in thesemiconductor substrate and between the first doped region and thesecond doped region, wherein the BDTI structure extends into thesemiconductor substrate from a back-side of the semiconductor substrate;an epitaxial structure lining the BDTI structure, wherein the epitaxialstructure separates the BDTI structure from the semiconductor substrate;a third doped region disposed in the semiconductor substrate, whereinthe third doped region has a second doping type opposite the firstdoping type, and wherein the third doped region is disposed between theBDTI structure and the first doped region and between the BDTI and thesecond doped region; and a well region disposed in the semiconductorsubstrate and extending into the semiconductor substrate from afront-side of the semiconductor substrate opposite the back-side of thesemiconductor substrate, and wherein the first doped region extends intothe well region from the back-side of the semiconductor substrate. 19.The image sensor of claim 18, wherein the well region has the seconddoping type.
 20. The image sensor of claim 19, wherein: the third dopedregion is disposed between the first doped region and the back-side ofthe semiconductor substrate; and the third doped region is disposedbetween the second doped region and the back-side of the semiconductorsubstrate.